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J-GLOBAL ID:201202284215385839   Reference number:12A0721276

ReRAM technology; challenges and prospects

ReRAM技術;課題および見通し
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Volume:Issue:Page: 795-807 (J-STAGE)  Publication year: 2012 
JST Material Number: U0039A  ISSN: 1349-2543  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Semiconductor integrated circuit 
Reference (33):
  • [1] Visit [Online] http://www.itrs.net/ for latest version of International Technology Roadmap of Semiconductors. Technology working groups of Emerging Research Devices and Materials show the functional oxides and ReRAM.
  • [2] H. Akinaga and H. Shima, “Resistive Random Access Memory (ReRAM) Based on Metal Oxides,” Special Issue of IEEE ProceedingsNanoelectronics Research for Beyond CMOS Information Processing,” vol. 98, no. 12, pp. 2237-2251, 2010.
  • [3] T. W. Hickmott, “Low-Frequency Negative Resistance in Thin Anodic Oxide Films,” J. Appl. Phys., vol. 33, no. 9, pp. 2669-2682, 1962.
  • [4] H. Shima and Y. Tamai, “Oxide nanolayer improving RRAM operational performance,” Microelectronics Journal, vol. 40, no. 3, pp. 628-632, 2009.
  • [5] J. F. Gibbons and W. E. Beadle, “Switching Properties of Thin NiO Films,” Solid-State Electronics, vol. 7, pp. 785-797, 1964.
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