Art
J-GLOBAL ID:201302211637135401   Reference number:13A0853623

反応性スパッタリング法によるAl2O3:H薄膜の作製と評価

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Material:
Volume: 60th  Page: ROMBUNNO.29A-A4-5  Publication year: Mar. 11, 2013 
JST Material Number: Y0054B  ISSN: 2436-7613  Document type: Proceedings
Article type: 短報  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Oxide thin films  ,  Photoconduction,photoelectromotive force 
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