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Art
J-GLOBAL ID:201302216177416409   Reference number:13A1418964

Evaluation of the Initial Stage of Formation of Ti/Al Ohmic Contacts Using Photoresponse Method

光応答法を用いたTi/Al Ohm接触の形成の初期段階の評価
Author (4):
Material:
Volume: 52  Issue: 8,Issue 2  Page: 08JN06.1-08JN06.4  Publication year: Aug. 25, 2013
JST Material Number: G0520B  ISSN: 0021-4922  CODEN: JJAPB6  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Semi thesaurus term:
Thesaurus term/Semi thesaurus term
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All keywords is available on JDreamIII(charged).
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JST classification (4):
JST classification
Category name(code) classified by JST.
Semiconductor-metal contacts  ,  Metallic thin films  ,  Semiconductor thin films  ,  Photoconduction,photoelectromotive force 
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