Art

J-GLOBAL ID：201302275292184348   Reference number：13A1323530

Effect of excess Bi on structure and ferroelectric properties of polycrystalline BiFeO₃ thin films

多結晶BiFeO₃薄膜の構造特性と強誘電性に及ぼす過剰Biの影響

Author (5)： YAN Jingdan (Dep. of Materials Sci. and Engineering, Graduate School of Engineering, Nagoya Inst. of Technol., Gokiso-cho ...) ,  GOMI Manabu (Dep. of Materials Sci. and Engineering, Graduate School of Engineering, Nagoya Inst. of Technol., Gokiso-cho ...) ,  HATTORI Takashi (Dep. of Materials Sci. and Engineering, Graduate School of Engineering, Nagoya Inst. of Technol., Gokiso-cho ...) ,  YOKOTA Takeshi (Dep. of Materials Sci. and Engineering, Graduate School of Engineering, Nagoya Inst. of Technol., Gokiso-cho ...) ,  SONG Huaihe (State Key Lab. of Chemical Resource Engineering, Beijing Univ. of Chemical Technol., Beijing 100029, CHN)
Material： Thin Solid Films
Volume： 542  Page： 150-154  Publication year： Sep. 02, 2013 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： *ferroelectricity ,  *bismuth compound ,  *ferrite ,  *iron compound ,  Bismuth ,  thin film growth ,  *solution growth ,  dielectric thin film ,  dielectric polarization ,  tensile stress ,  lattice distortion ,  *bismuth ferrite ,  in-plane stress
Semi thesaurus term： *CSD ,  bismuth iron oxide ,  saturation polarization

JST classification (1)： Oxide thin films  (BK14050P)

Terms in the title (6)： 多結晶 ,  BiFeO3 ,  薄膜 ,  構造特性 ,  強誘電性 ,  Bi