Art

J-GLOBAL ID：201302280793548289   Reference number：13A0235936

Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells

シリコン太陽電池用の逆ピラミッド作製におけるTMAHとKOHのエッチング特性の違い

Author (6)： FAN Yujie (State Key Lab. on Integrated Optoelectronics, Inst. of Semiconductors, Chinese Acad. of Sciences, No. 35A Qinghua ...) ,  HAN Peide (State Key Lab. on Integrated Optoelectronics, Inst. of Semiconductors, Chinese Acad. of Sciences, No. 35A Qinghua ...) ,  LIANG Peng (State Key Lab. on Integrated Optoelectronics, Inst. of Semiconductors, Chinese Acad. of Sciences, No. 35A Qinghua ...) ,  XING Yupeng (State Key Lab. on Integrated Optoelectronics, Inst. of Semiconductors, Chinese Acad. of Sciences, No. 35A Qinghua ...) ,  YE Zhou (State Key Lab. on Integrated Optoelectronics, Inst. of Semiconductors, Chinese Acad. of Sciences, No. 35A Qinghua ...) ,  HU Shaoxu (State Key Lab. on Integrated Optoelectronics, Inst. of Semiconductors, Chinese Acad. of Sciences, No. 35A Qinghua ...)
Material： Applied Surface Science  (Appl Surf Sci)
Volume： 264  Page： 761-766  Publication year： Jan. 01, 2013 
JST Material Number： B0707B  ISSN： 0169-4332  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： *solar cell ,  pattern formation ,  *pyramid ,  *etching ,  etching solution ,  *potassium hydroxide ,  surface modification ,  morphology (form) ,  surface structure ,  undercut ,  machining speed ,  *silicon solar battery ,  surface morphology ,  structure
Semi thesaurus term： *anti-reflection structure ,  surface morphology

JST classification (2)： Manufacturing technology of solid-state devices  (NC03030V) ,  Solar cell  (NC03084O)

Substance index (1)： Tetramethylammonium hydroxide

Terms in the title (6)： シリコン太陽電池 ,  ピラミッド ,  作製 ,  TMAH ,  KOH ,  エッチング特性