Art

J-GLOBAL ID：201302282689123694   Reference number：13A1502325

Preparation, Photoisomerization, and Microfabrication with Two-Photon Polymerization of Crosslinked Azo-Polymers

架橋したアゾ-重合体の二光子による調製,光異性化,および微細加工

Author (10)： WANG Hui (Technical Inst. of Physics and Chemistry, Chinese Acad. Sci., Beijing, CHN) ,  WANG Hui (Graduate Univ., Chinese Acad. of Sci., Beijing, CHN) ,  JIN Feng (Technical Inst. of Physics and Chemistry, Chinese Acad. Sci., Beijing, CHN) ,  CHEN Shu (Technical Inst. of Physics and Chemistry, Chinese Acad. Sci., Beijing, CHN) ,  CHEN Shu (Graduate Univ., Chinese Acad. of Sci., Beijing, CHN) ,  DONG Xian-Zi (Technical Inst. of Physics and Chemistry, Chinese Acad. Sci., Beijing, CHN) ,  ZHANG Yong-Liang (Technical Inst. of Physics and Chemistry, Chinese Acad. Sci., Beijing, CHN) ,  CHEN Wei-Qiang (Technical Inst. of Physics and Chemistry, Chinese Acad. Sci., Beijing, CHN) ,  ZHAO Zhen-Sheng (Technical Inst. of Physics and Chemistry, Chinese Acad. Sci., Beijing, CHN) ,  DUAN Xuan-Ming (Technical Inst. of Physics and Chemistry, Chinese Acad. Sci., Beijing, CHN)
Material： Journal of Applied Polymer Science  (J Appl Polym Sci)
Volume： 130  Issue： 4  Page： 2947-2956  Publication year： Nov. 15, 2013 
JST Material Number： C0467A  ISSN： 0021-8995  CODEN： JAPNAB  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： *fine patterning ,  photon ,  photopolymerization ,  Photochemistry ,  crosslinking ,  optical property ,  synthesis ,  optical communication ,  circuit component ,  chromophore ,  *photoresist ,  telecommunication ,  photonic band gap ,  crystal ,  isomerization ,  *acrylic resin ,  azo compound ,  aromatic compound ,  aliphatic carboxylic acid ,  olefin compound ,  unsaturated carboxylic acid ,  carboxylate (ester) ,  photonic crystal ,  diphoton ,  *azobenzenes
Semi thesaurus term： cis-trans isomerization ,  *azobenzene derivative ,  telecommunication ,  photonic crystal ,  optical communication device ,  microfabrication

JST classification (1)： Copolymerization  (CG04030D)

Substance index (4)： Dipentaerythritol hexaacrylate ,  Methacrylic acid methyl ,  Bis(acrylic acid)(3-tert-butylazobenzene-4,4′-diyl)bis(oxytrimethylene) ester ,  Bis(acrylic acid)(3-tert-butylazobenzene-4,4′-diyl)bis(oxyhexamethylene) ester

Terms in the title (6)： 架橋 ,  重合体 ,  二光子 ,  調製 ,  光異性化 ,  微細加工