Rchr
J-GLOBAL ID:201401000598455919   Update date: Jan. 30, 2024

Ikenoue Takumi

イケノウエ タクミ | Ikenoue Takumi
Affiliation and department:
Research field  (1): Electric/electronic material engineering
Research theme for competitive and other funds  (18):
  • 2023 - 2025 超濃厚水溶液による白金族金属の溶解:低エネルギー消費型リサイクルプロセスの構築
  • 2022 - 2025 大気開放下での非水電解液を用いたアルミニウム電気めっき技術の開発
  • 2022 - 2024 光電変換効率の増強を示すハライド・ペロブスカイトの三次元フォトニック結晶の作製
  • 2020 - 2023 Development of power device with rock salt structure wide bandgap semiconductor grown by mist CVD method
  • 2022 - 2023 Realization of oxide power device using Li-doped NiMgO single crystal grown by mist CVD method
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Papers (36):
  • Hisato Nishii, Shintarou Iida, Akira Yamasaki, Takumi Ikenoue, Masao Miyake, Toshiya Doi, Tetsuji Hirato. Fabrication of epitaxial V2O3 thin films on Al2O3 substrates via mist chemical vapor deposition. Journal of Crystal Growth. 2024. 626. 127484-127484
  • Shota Higashino, Yoshikazu Takeuchi, Masao Miyake, Takuma Sakai, Takumi Ikenoue, Masakazu Tane, Tetsuji Hirato. Toward Tungsten Electrodeposition at Moderate Temperatures Below 100 °C Using Chloroaluminate Ionic Liquids. Journal of The Electrochemical Society. 2023. 170. 5. 052501-052501
  • Masao Miyake, Yuya Tanaka, Takumi Ikenoue, Tetsuji Hirato. Fabrication of micron-sized three-dimensional porous Al from an Al-Zn monotectoid alloy via selective etching and Al passivation. Journal of Materials Science. 2023. 58. 19. 8169-8177
  • Masao Miyake, Takashi Kita, Takumi Ikenoue, Tetsuji Hirato. Aluminum Barrel Plating on Steel Bolts Using Chloroaluminate Ionic Liquids. Journal of The Electrochemical Society. 2022. 169. 7. 072509-072509
  • Yuki Haruta, Mioko Kawakami, Yuui Nakano, Soumya Kundu, Shinji Wada, Takumi Ikenoue, Masao Miyake, Tetsuji Hirato, Makhsud I. Saidaminov. Scalable Fabrication of Metal Halide Perovskites for Direct X-ray Flat-Panel Detectors: A Perspective. Chemistry of Materials. 2022
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MISC (124):
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Patents (1):
Books (1):
  • PEDOTの材料物性とデバイス応用
    サイエンス&テクノロジー株式会社 2012
Lectures and oral presentations  (5):
  • Growth and characterization of p-type oxide semiconductor thin films by using mist CVD method
    (20th International Union of Materials Research Societies-International Conference in Asia 2019)
  • Hop Step Jump! 高専の先に広がる未来
    (文部科学省 情報ひろば特別展示・イベント 2018)
  • 液摘(ミスト)を用いた成膜技術とデバイス応用
    (第4回 製鋼部会 産学交流会 2017)
  • ミストCVD法を用いた光吸収層用酸化物・硫化物の成長
    (文部科学省 ナノテクノロジープラットフォーム事業 微細加工プラットフォーム 第2回広島大学・山口大学・香川大学・FAIS 合同シンポジウム 2016)
  • ミスト CVD 法による銅系材料の成膜
    (ナノテク研シンポジウム2015 2015)
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