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J-GLOBAL ID:201402223230199052   Reference number:14A0622721

Highly separated hybrid orientation structure of CeO2(100) and (110) on Si(100) substrates by electron beam-induced orientation-selective epitaxy

電子ビーム誘起配向選択エピタクシーによるSi(100)基板上のCeO2(100)及び(110)の高度分離ハイブリッド方位構造
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Volume: 32  Issue:Page: 03D108-03D108-6  Publication year: May. 2014 
JST Material Number: E0974A  ISSN: 2166-2746  CODEN: JVTBD9  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Oxide thin films  ,  Applications of electron beams and ion beams 
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