Art

J-GLOBAL ID：201402225664693449   Reference number：14A1476535

UV and air stability of high-efficiency photoluminescent silicon nanocrystals

高効率光ルミネセンスシリコンナノ結晶のUV及び空気安定性

Author (9)： YANG Jihua (Dep. of Mechanical Engineering, Univ. of Minnesota, Minneapolis, MN 55455, USA) ,  LIPTAK Richard (Dep. of Electrical and Computer Engineering, Univ. of Minnesota, Minneapolis, MN 55455, USA) ,  LIPTAK Richard (Dep. of Physics and Optical Engineering, Rose-Hulman Inst. of Technol., 5500 Wabash Ave, Terre Haute, IN 47803, USA) ,  ROWE David (Dep. of Mechanical Engineering, Univ. of Minnesota, Minneapolis, MN 55455, USA) ,  WU Jeslin (Dep. of Mechanical Engineering, Univ. of Minnesota, Minneapolis, MN 55455, USA) ,  CASEY James (Dow Corning Corp., 2200 W. Salzburg Road, Midland, MI 48686, USA) ,  WITKER David (Dow Corning Corp., 2200 W. Salzburg Road, Midland, MI 48686, USA) ,  CAMPBELL Stephen A. (Dep. of Electrical and Computer Engineering, Univ. of Minnesota, Minneapolis, MN 55455, USA) ,  KORTSHAGEN Uwe (Dep. of Mechanical Engineering, Univ. of Minnesota, Minneapolis, MN 55455, USA)
Material： Applied Surface Science  (Appl Surf Sci)
Volume： 323  Page： 54-58  Publication year： Dec. 30, 2014 
JST Material Number： B0707B  ISSN： 0169-4332  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： *silicon ,  *nano crystal ,  *plasma phase synthesis ,  *photoluminescence ,  ultraviolet irradiation ,  Air ,  *hydrosilylation ,  *quantum efficiency ,  *passivation ,  doping ,  phosphorus ,  semiconductor ,  near infrared radiation ,  infrared emission spectrum ,  quenching (light) ,  afterglow ,  *Hydrogen ,  light resistance ,  weather resistance ,  ultraviolet resistance ,  *modification
Semi thesaurus term： ultraviolet resistance

JST classification (2)： Luminescence of semiconductors  (BM08092S) ,  Applications of plasma  (BJ02110K)

Terms in the title (4)： 高効率 ,  光ルミネセンス ,  シリコンナノ結晶 ,  安定性