Rchr
J-GLOBAL ID：201601019183419729
Update date: Jul. 23, 2022
Noda Yoshimasa
ノダ ヨシマサ | Noda Yoshimasa
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Affiliation and department：
Ashikaga University AIT Collaborative Research Center
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Detailed information
Research field (1)：
Machine materials and mechanics
Research keywords (5)：
Ceramics
, Solar car
, Electric Vehicle
, Ram pump
, Thermal spray
Papers (11)：
Dickson Kindole, Ifeanacho Anyadiegwu, Yasutaka Ando, Yoshimasa Noda, Hideya Nishiyama, Satoshi Uehara, Tomoki Nakajima, Oleg P. Solonenko, A. V. Smirnov, A. A. Golovin. Rapid deposition of photocatalytically enhanced TiO
2
film by atmospheric spps using Ar/N
2
-Vortex Plasma Jet. Materials Transactions. 2018. 59. 3. 462-468
Yasutaka Ando, Dickson Kindole, Yoshimasa Noda, Richard N. Mbiu, Bernerd K. Kosgey, Stephen M. Maranga, Akira Kobayashi. Alumina and titania films deposition by APS/ASPPS dual mode thermal spray equipment using Ar added N
2
working gas. Vacuum. 2017. 136. 203-208
Yasutaka Ando, Yoshimasa Noda, Shin ichiro Adachi. Rapid Diamond Deposition on Ni and Co Coatings by Using Twin Acetylene/Oxygen Gas Welding Torches. Journal of Thermal Spray Technology. 2015. 24. 8. 1408-1414
Yoshimasa Noda, Hiroyuki Ogiwara, Misao Itoi, Mutsuo Nakaoka. A single-stage type highly efficient ZVS-SEPP high frequency inverter for induction heating applications. 16th International Power Electronics and Motion Control Conference and Exposition, PEMC 2014. 2014. 53-58
Yasutaka Ando, Yoshimasa Noda, Akira Kobayashi. Photo-catalytic titanium oxide film deposition by atmospheric TPCVD using vortex Ar plasma jet. Vacuum. 2014. 110. 190-195
ｍore...
MISC (27)：
Hadi A Hsian Sagr, Ronoh Geoffrey Kibiegon, Oluwafunmilade Alabi Kelvin. Application of TiO2 Film Deposited by Low Power Atmospheric Plasma Spray Equipment to DSSC. Applied Plasma Science. 2017. 25. 2. 65-70
Deposition of Titanium Oxide Film by Atmospheric Plasma Spray Using Titanium Hydroxide Feedstock Powder. 2015. 23. 2. 81-86
ANDO Yasutaka, CHEN Shengyuan, NODA Yoshimasa. Nitrogen doped TiO_2 film deposition by atmospheric thermal plasma CVD. 2013. 2013. 58. 41-42
ANDO Yasutaka, CHEN Sheng yuan, NODA Yoshimasa. 20406 Low Temperature Titanium Oxide Film Deposition by Atmospheric Thermal Plasma CVD using Pulsed Air Plasma. The Proceedings of Conference of Kanto Branch. 2013. 2013. 0. 301-302
CHEN Shengyuan, HIROKI Takayuki, HYASHI Takuya, IWAGAMI Hiroki, NODA Yoshimasa, ANDO Yasutaka. 20407 Effects of substrate traversing on film deposition in atmospheric thermal plasma CVD using vortex Ar plasma. The Proceedings of Conference of Kanto Branch. 2013. 2013. 0. 303-304
ｍore...
Patents (1)：
アキシャル可変ギャップ式回転電機
Lectures and oral presentations (5)：
Nitrogen doped TiO_2 film deposition by atmospheric thermal plasma CVD
(電気学会研究会資料. PST, プラズマ研究会 2013)
20407 Effects of substrate traversing on film deposition in atmospheric thermal plasma CVD using vortex Ar plasma
(日本機械学会関東支部総会講演会講演論文集 2013)
20406 Low Temperature Titanium Oxide Film Deposition by Atmospheric Thermal Plasma CVD using Pulsed Air Plasma
(日本機械学会関東支部総会講演会講演論文集 2013)
Influence of Feedstock Feed Rate on Quality of Titanium Oxide Film in Atmospheric Thermal Plasma CVD Using Vortex Ar Plasma
(プラズマ応用科学 2012)
Zinc Oxide Film Deposition by Atmospheric Thermal Plasma CVD using Vortex Ar Plasma Jet
(全国講演大会講演論文集 2012)
Professional career (1)：
博士(工学) (足利工業大学)
Committee career (2)：
2011/04 - 現在 日本金属学会 関東支部ヤングメタラジスト研究交流会実行委員会 委員
2014/04 - 2016/03 日本機械学会 関東支部栃木ブロック商議員
Association Membership(s) (4)：
THE CERAMIC SOCIETY OF JAPAN
, THE JAPAN INSTITUTE OF METALS AND MATERIALS
, THE JAPAN SOCIETY OF MECHANICAL ENGINEERS
, JAPAN THERMAL SPRAY SOCIETY
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