Art
J-GLOBAL ID:201602008228944317
Reference number:66A0317630
真空蒸着膜の内部応力(1960年以降の研究)
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Author (2):
,
Material:
Volume:
35
Issue:
4
Page:
283-293
Publication year:
1966
JST Material Number:
F0252A
ISSN:
0369-8009
CODEN:
OYBSA
Document type:
Article
Article type:
不明
Country of issue:
Japan (JPN)
Reference (40):
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1) 近藤英樹,木下是雄:応用物理 28 (1959) 553.
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2) 金原 粲:薄膜工学ハンドブック,学振薄膜第131委員会編 (ダイヤモンド社, 1964) P II-26.
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3) 沢木 司:真空蒸着,真空技術講座 10 (日刊工業新聞社, 1965) 188.
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4) R. W. Hoffman: Thin Films, Papers Presented at a Seminar of the American Society for Metals, Oct., 19 and 20, 1963 (Chapman & Hall, 1964) 99.
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5) R. W. Hoffman: Physics of Thin Films, ed. G. Hass, 3 (Academic Press 1965).
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