Art
J-GLOBAL ID：201602011980105759 Reference number：58A0020015
Residual Concentration of a Daughter Substance Removed by a Bimolecular Reaction.
二分子反応により除かれた先発-分子反応の生成物の残留濃度
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Author (1)：
ROTHSTEIN J
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Material：
J Chem Phys (Journal of Chemical Physics)
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Volume：
28
Issue：
1
Page：
153-163
Publication year：
1958
JST Material Number：
C0275A
ISSN：
0021-9606
CODEN：
JCPSA6
Document type：
Article
Country of issue：
United States (USA)
Terms in the title (4)：
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二分子反応
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,
分子
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生成物
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残留濃度
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