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J-GLOBAL ID：201602014130205257   Reference number：73A0043542

Observation of thermally induced stress in amorphous semiconductors by i. r. crossed nicols.

赤外直交ニコルによる無定形半導体中の熱的に生じた応力の観察
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Author (3)：
KUROSU T

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, 
SAITO M

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, 
KIKUCHI M

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Material：
Solid State Commun  (Solid State Communications)

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Volume： 12  Issue： 5  Page： 363-367  Publication year： 1973 
JST Material Number： H0499A  ISSN： 0038-1098  Document type： Article
Article type： 短報  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
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ひずみ

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, 
応力

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, 
半導体

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, 
無定形

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Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
ひび割れ

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無定形半導体

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Terms in the title (4)：
Terms in the title
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赤外

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, 
無定形

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応力

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, 
観察

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