Art
J-GLOBAL ID:201602020650551247   Reference number:58A0020409

Kinetics of the Oxidation and Nitridation of Silicon at High Temperatures.

高温における酸素,二酸化炭素,窒素または0.2%窒素を含むアルゴン中のけい素の酸化または窒化反応速度
Author (2):
Material:
Volume: 62  Issue:Page: 1064-1067  Publication year: 1958
JST Material Number: C0334A  ISSN: 0022-3654  CODEN: JPCHAX  Document type: Article
Country of issue: United States (USA) 

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