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J-GLOBAL ID:201602249842450960   Reference number:16A0472293

X-ray photoelectron spectroscopy analysis of boron defects in silicon crystal: A first-principles study

シリコン結晶中のホウ素欠陥のX線光電子分光解析:第1原理研究
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Material:
Volume: 119  Issue: 17  Page: 175704-175704-9  Publication year: May. 07, 2016 
JST Material Number: C0266A  ISSN: 0021-8979  CODEN: JAPIAU  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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JST classification (5):
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Irradiational changes semiconductors  ,  Lattice defects in semiconductors  ,  Electron spectroscopy  ,  Magnetic resonance,electron spectroscopy,other atomic spectra  ,  Numerical computation 

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