Art

J-GLOBAL ID：201602251042265421   Reference number：16A1305432

Fabrication and Characterization of Molecular Films of 11-Oxa[9]helicene and 9-Diethyleneglycoxy-11-oxa[9]helicene

11-オキサ[9]ヘリセンおよび9-ジエチレングリコキシ-11-オキサ[9]ヘリセン分子膜の作製と評価

Author (7)： Miah Md Jalil (Graduate School of Engineering, Utsunomiya University) ,  Shahabuddin Mohammad (Graduate School of Engineering, Utsunomiya University) ,  Kayes Md. Nazmul (Graduate School of Engineering, Utsunomiya University) ,  Karikomi Michinori (Graduate School of Engineering, Utsunomiya University) ,  Nasuno Eri (Graduate School of Engineering, Utsunomiya University) ,  Kato Norihiro (Graduate School of Engineering, Utsunomiya University) ,  Iimura Ken-ichi (Graduate School of Engineering, Utsunomiya University)
Material： Transactions of the Materials Research Society of Japan  (Trans Mater Res Soc Jpn)
Volume： 41  Issue： 2  Page： 151-154(J-STAGE)  Publication year： 2016 
JST Material Number： L4468A  ISSN： 1382-3469  Document type： Proceedings
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： characteristic ,  gas-liquid interface ,  aggregation ,  wafer ,  silicon ,  X-ray reflection ,  hydrophobic ,  visible spectrum ,  ultraviolet spectrum ,  optical gap ,  photocurrent ,  current density ,  *organic semiconductor ,  chemical compound ,  *semiconductor thin film ,  Si wafer ,  photoelectrochemical property ,  UV-Vis spectrum ,  air-water interface ,  derivative compounds
Semi thesaurus term： air/water interface ,  derivative

Author keywords (5)： oxa[9]helicene ,  organic semiconductor ,  thin film ,  Langmuir technique ,  photocurrent

JST classification (1)： Thin films of organic compounds  (BK14070L)

Substance index (3)： 9-Helicene ,  2,2′-Oxy-1,1′-bibenzo[c]phenanthrene ,  4-[2-(2-Hydroxyethoxy)ethoxy]-2,2′-epoxy[1,1′-bi[benzo[c]phenanthrene]]

Reference (25)：

• [1] J. E. Anthony, Chem. Rev., 106, 5028-5048 (2006).
• [2] R. H. Martin, Angew. Chem., Int. Ed. 13, 649-660 (1974).
• [3] S. D. Han, D. R. Anderson, A. D. Bond, H. V. Chu, R. L. Disch, D. Holmes, J. M. Schulman, S. J. Teat, K. P. C. Vollhardt, G. D. Whitener, Angew. Chem., Int. Ed., 41, 3227-3230 (2002).
• [4] (a) A. J. Lovinger, C. Nuckolls, T. J. Katz, J. Am. Chem. Soc., 120, 264-268 (1998). (b) C. Nuckolls, J. Katz, T. Verbiest, S. V. Elshocht, H. G. Kuball, S. Kiesewalter, A. J. Lovinger, A. Persoons, J. Am. Chem. Soc., 120, 8656-8660 (1998).
• [5] J. E. Field, G. Muller, J. P. Riehl, D. Venkataraman, J. Am. Chem. Soc., 125, 11808-11809 (2003).

Terms in the title (4)： ヘリセン ,  分子 ,  作製 ,  評価