Art

J-GLOBAL ID：201602272481808045   Reference number：16A1321228

Perfect Composition Depth Profiling of Ionic Liquid Surfaces Using High-resolution RBS/ERDA

高分解能RBS/ERDAを用いるイオン液体表面の完全組成深さプロファイリング

Author (6)： NAKAJIMA Kaoru (Department of Micro Engineering, Kyoto University) ,  ZOLBOO Enkhbayar (Department of Micro Engineering, Kyoto University) ,  OHASHI Tomohiro (Department of Micro Engineering, Kyoto University) ,  LISAL Martin (Laboratory of Aerosols Chemistry and Physics, Institute of Chemical Process Fundamentals of the CAS) ,  LISAL Martin (Department of Physics, Faculty of Science, J. E. Purkinje University) ,  KIMURA Kenji (Department of Micro Engineering, Kyoto University)
Material： Analytical Sciences  (Anal Sci)
Volume： 32  Issue： 10  Page： 1089-1094(J-STAGE)  Publication year： 2016 
JST Material Number： G0673B  ISSN： 0910-6340  CODEN： ANSCEN  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *ionic liquid ,  *depth profile ,  Rutherford back scattering ,  *Rutherford scattering spectroscopy ,  Computer Simulation ,  *radiation absorption analysis ,  *surface structure ,  preferred orientation ,  Molecular Dynamics Simulation ,  *ERD Analysis ,  computer application ,  utilization ,  *structure
Semi thesaurus term： *elastic recoil detection analysis

Author keywords (5)： Surface structure ,  ionic liquid ,  hydrogen ,  ERDA ,  RBS

JST classification (2)： Molten salts  (CB05050R) ,  Radiochemical analysis of organic compounds  (CC06034V)

Substance index (3)： 1-Ethyl-3-methyl-1H-imidazole-3-ium・bis(trifluoromethylsulfonyl)amineanion ,  [C₆Mim][NTf₂ ,  [C₁₀mim][Tf₂N]

Reference (31)：

• 1. T. Janssens and W. Vandervorst, in Proceedings of SIMS XII, ed. A. Benninghoven, P. Bertrand, H. N. Migeon, and H. W. Werner, 1998, Elsevier, Amsterdam.
• 2. T. H. Buyuklimanli, C. W. Magee, J. W. Marino, and S. R. Walther, J. Vac. Sci. Technol., B, 2006, 24, 408.
• 3. M. Wilde and K. Fukutani, Surf. Sci. Rep., 2014, 69, 196.
• 4. W. M. Arnold Bik and F. H. P. M. Habraken, Rep. Prog. Phys., 1993, 56, 859.
• 5. K. Kimura, K. Nakajima, S. Yamanaka, M. Hasegawa, and H. Okushi, Appl. Phys. Lett., 2001, 78, 1679.

Terms in the title (4)： 高分解能 ,  イオン液体 ,  組成 ,  深さプロファイリング