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J-GLOBAL ID：201702218242580568   Reference number：17A1092049

Sum frequency generation spectroscopy study of hydrogenated stepped Si(111) surfaces made by molecular hydrogen exposure

分子水素曝露により作製した水素化ステップのあるSi(111)表面の和周波数発生分光法による研究【Powered by NICT】

Author (5)： Hien K.T.T. (School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan) ,  Sattar M.A. (School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan) ,  Miyauchi Y. (Department of Physics, National Academy of Japan, Hashirimizu 1-10-20, Yokosuka, Kanagawa 239-8686, Japan) ,  Mizutani G. (School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan) ,  Rutt H.N. (School of Electronics and Computer Science, University of Southampton, Southampton SO17 1BJ, U.K)
Material： Surface Science  (Surface Science Letters)
Volume： 663  Page： 11-15  Publication year： 2017 
JST Material Number： C0129B  ISSN： 0039-6028  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Abstract/Point： Hydrogen adsorption on stepped...

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Thesaurus term： hydride ,  *sum frequency generation ,  *hydrogen ,  oscillation mode ,  *hydrogenation ,  wet etching ,  polarized light ,  spectrum ,  vacuum vessel
Semi thesaurus term： テラス ,  高純度 ,  水素吸着 ,  *シリコン(111) , 【Automatic Indexing@JST】

Author keywords (4)： Sum frequency generation ,  vibration ,  hydrogen dosing ,  wet chemical etching

JST classification (2)： Surface structure of semiconductors  (BK15030A) ,  Study of adsorption by physical means  (CB12043P)

Terms in the title (9)： 分子 ,  水素 ,  曝露 ,  作製 ,  水素化 ,  Si ,  和周波数発生 ,  分光法 ,  研究