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J-GLOBAL ID:201702219140323340   Reference number:17A1003308

Energetic consideration of compounds at Mg2Si-Ni electrode interlayer produced by spark-plasma sintering

スパークプラズマ焼結法により形成したMg2Si-Ni電極中間層における化合物のエネルギー論的考察
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Volume: 56  Issue: 5S1  Page: 05DC03.1-05DC03.8  Publication year: May. 2017 
JST Material Number: G0520B  ISSN: 0021-4922  CODEN: JJAPB6  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Semiconductor thin films  ,  Techniques and equipment of thin film deposition  ,  Crystal structure of inorganic compounds in general  ,  Numerical computation 
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