Art

J-GLOBAL ID：201702222027590075   Reference number：17A0565313

Intermittent Behavior of Local Electron Temperature in a Linear ECR Plasma

線形ECRプラズマ中の局所的電子温度の間欠的挙動

Author (5)： YOSHIMURA Shinji (National Institute for Fusion Science) ,  TERASAKA Kenichiro (Interdisciplinary Graduate School of Engineering Science, Kyushu University) ,  TANAKA Eiki (Interdisciplinary Graduate School of Engineering Science, Kyushu University) ,  ARAMAKI Mitsutoshi (College of Industrial Technology, Nihon University) ,  TANAKA Masayoshi Y. (Interdisciplinary Graduate School of Engineering Science, Kyushu University)
Material： Plasma and Fusion Research (Web)  (Plasma Fusion Res (Web))
Volume： 10  Page： 3401028(J-STAGE)  Publication year： 2015 
JST Material Number： U0045A  ISSN： 1880-6821  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： plasma device ,  *electron cyclotron resonance heating ,  *electron temperature ,  electric potential ,  *probabilistic density function ,  *Poisson process ,  *intermittency ,  queuing time ,  duration time ,  atomic weight
Semi thesaurus term： floating electric potential ,  persistence time

Author keywords (7)： intermittency ,  laboratory plasma ,  electron cyclotron resonance ,  local electron temperature ,  floating potential ,  probability density function ,  Poisson process

JST classification (1)： Plasma devices  (BJ02082I)

Reference (11)：

• [1] G.S. Xu et al., Nucl. Fusion 49, 092002 (2009).
• [2] T.A. Carter, Phys. Plasmas 13, 010701 (2006).
• [3] T. Windisch et al., Plasma Phys. Control. Fusion 53, 085001 (2011).
• [4] N. Ohno et al., J. Plasma Fusion Res. 78, 1093 (2002) [in Japanese].
• [5] K. Terasaka et al., Rev. Sci. Instrum. 85, 113503 (2014).

Terms in the title (5)： 線形 ,  ECRプラズマ ,  電子温度 ,  間欠 ,  挙動