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J-GLOBAL ID：201702224443581107   Reference number：17A1537363

Protecting and Leaving Functions of Trimethylsilyl Groups in Trimethylsilylated Silicates for the Synthesis of Alkoxysiloxane Oligomers

アルコキシシロキサンオリゴマの合成のためのトリメチルシリル化シリケートのトリメチルシリル基の保護および脱離基【Powered by NICT】

Author (8)： Yoshikawa Masashi (Department of Applied Chemistry, Faculty of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo, 169-8555, Japan) ,  Tamura Yasuhiro (Department of Applied Chemistry, Faculty of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo, 169-8555, Japan) ,  Wakabayashi Ryutaro (Department of Applied Chemistry, Faculty of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo, 169-8555, Japan) ,  Wakabayashi Ryutaro (Kagami Memorial Research Institute for Materials Science and Technology, Waseda University, 2-8-26 Nishiwaseda, Shinjuku-ku, Tokyo, 169-0051, Japan) ,  Tamai Misa (Department of Applied Chemistry, Faculty of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo, 169-8555, Japan) ,  Shimojima Atsushi (Department of Applied Chemistry, Faculty of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo, 169-8555, Japan) ,  Kuroda Kazuyuki (Department of Applied Chemistry, Faculty of Science and Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo, 169-8555, Japan) ,  Kuroda Kazuyuki (Kagami Memorial Research Institute for Materials Science and Technology, Waseda University, 2-8-26 Nishiwaseda, Shinjuku-ku, Tokyo, 169-0051, Japan)
Material： Angewandte Chemie. International Edition  (Angewandte Chemie. International Edition in English)
Volume： 56  Issue： 45  Page： 13990-13994  Publication year： 2017 
JST Material Number： H0127B  ISSN： 1433-7851  CODEN： ACIEAY  Document type： Article
Article type： 短報  Country of issue： Germany, Federal Republic of (DEU)  Language： ENGLISH (EN)

Abstract/Point： The concept of protecting grou...

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Thesaurus term： *polysilanes ,  *oligomer ,  *silylation ,  bismuth chloride ,  *group(radical) ,  Lewis acid catalyst ,  steric hindrance ,  substituent effect ,  proton magnetic resonance ,  13C NMR ,  29Si NMR ,  substitution reaction ,  reaction mechanism
Semi thesaurus term： *trimethylsilylation ,  *ポリアルコキシシロキサン ,  *leaving group ,  *blocking group

Author keywords (5)： Lewis acids ,  nucleophilic substitution ,  protecting groups ,  siloxane oligomers ,  trimethylsilyl groups

JST classification (2)： Substitution reaction  (CF02020B) ,  Organosilicon compounds  (CF08030C)

Substance index (12)： Octakis(trimethylsiloxy)pentacyclo[9.5.1.1^3,9.1^5,15.1^7,13]icosaneoctasiloxane ,  Decamethyltetrasiloxane ,  (Chloromethyl)dimethylsilane ,  Methylchlorodimethoxysilane ,  Chlorovinyldimethoxysilane ,  Tetrakis(trimethylsiloxy)silane ,  Tetrakis(methyldimethoxysiloxy)silane ,  Tris(trimethylsilyloxy)(dimethoxyvinylsilyloxy)silane ,  Hexakis(trimethylsilyloxy)propanedisiloxane ,  Tris(trimethylsiloxy)silanol ,  Phenyl trimethicone ,  Tris[dimethoxy(methyl)silyloxy][vinyldimethoxysilyloxy]silane

Terms in the title (3)： トリメチルシリル化 ,  シリケート ,  脱離基