Art
J-GLOBAL ID：201702248507658647   Reference number：17A0020476

日本発次世代創薬のための化学 1 アカデミア低分子創薬

Author (1)：
NAGANO TETSUO

About NAGANO TETSUO

(東大 創薬機構)

About 東大 創薬機構


Material：
化学と工業  (Chemistry & Chemical Industry)

About 化学と工業


Volume： 70  Issue： 1  Page： 014-016  Publication year： Jan. 01, 2017 
JST Material Number： F0107A  ISSN： 0022-7684  CODEN： KAKTAF  Document type： Article
Article type： 解説  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*product development

About product development

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*アカデミア低分子創薬

About アカデミア低分子創薬

,...
Register(free) or Log In to access 

Please login to MyJ-GLOBAL to see full information. You also need to select "Display abstract, etc. of medical articles" in your MyJ-GLOBAL account page in order to see abstracts, etc. of medical articles.

   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=17A0020476&from=J-GLOBAL&jstjournalNo=F0107A") }}
JST classification (1)：
JST classification
Category name(code) classified by JST.
Research and development 
(GU01040N)

About Research and development

Reference (5)：
Terms in the title (6)：
Terms in the title
Keywords automatically extracted from the title.
日本

About 日本

, 
次世代

About 次世代

, 
創薬

About 創薬

, 
化学

About 化学

, 
アカデミア

About アカデミア

, 
低分子

About 低分子


Return to Previous Page

TOP

BOTTOM