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J-GLOBAL ID：201702258394687972   Reference number：17A0963995

Thickness Measurement of Oxide and Carbonaceous Layers on a ²⁸Si Sphere by XPS

XPSによる~28Si球上の酸化物と炭素質層の厚さ測定【Powered by NICT】

Author (5)： Zhang Lulu (National Metrology Institute of Japan/National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan) ,  Kuramoto Naoki (National Metrology Institute of Japan/National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan) ,  Azuma Yasushi (National Metrology Institute of Japan/National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan) ,  Kurokawa Akira (National Metrology Institute of Japan/National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan) ,  Fujii Kenichi (National Metrology Institute of Japan/National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan)
Material： IEEE Transactions on Instrumentation and Measurement  (IEEE Trans Instrum Meas)
Volume： 66  Issue： 6  Page： 1297-1303  Publication year： 2017 
JST Material Number： C0232A  ISSN： 0018-9456  CODEN： IEIMAO  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： Surface layer characterization...

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Thesaurus term： *silicon ,  X-ray photoelectron spectroscopy ,  *oxide ,  Uncertainty ,  *Carbon ,  surface course ,  *thickness measurement ,  characterization ,  X-ray reflectometry ,  oxide layer ,  high accuracy ,  Avogadro constant

JST classification (3)： Measuring methods and instruments of length,area,cross section,volume,angle  (AD05020O) ,  Measuring methods and instruments of mass,density,specific gravity  (AD05030Z) ,  Interferometry and interferometers  (BD07070G)

Terms in the title (4)： XPS ,  酸化物 ,  炭素質 ,  厚さ測定