Art
J-GLOBAL ID:201702265872934746   Reference number:17A1810410

Generation of ultra high-power thermal plasma jet and its application to crystallization of amorphous silicon films

超大パワー熱プラズマジェットの発生とアモルファスシリコン膜結晶化への応用
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Material:
Volume: 56  Issue: 6S2  Page: 06HE05.1-06HE05.4  Publication year: Jun. 2017 
JST Material Number: G0520B  ISSN: 0021-4922  CODEN: JJAPB6  Document type: Article
Article type: 短報  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Category name(code) classified by JST.
Crystal growth of semiconductors  ,  Semiconductor thin films 

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