Rapid Nitridation of Ti Surface using Ar/N<sub>2</sub>/H<sub>2</sub> Loop Type of Inductively Coupled Thermal Plasmas

FUJITA ATSUSHI; TSUCHIYA TAKUMI; TANAKA YASUNORI; UESUGI YOSHIHIKO; ISHIJIMA TATSUO; YUKIMOTO TETSUYA; KAWAURA HIROSHI

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J-GLOBAL ID：201702287046365204 Reference number：17A1694186

Rapid Nitridation of Ti Surface using Ar/N₂/H₂ Loop Type of Inductively Coupled Thermal Plasmas

ループ型Ar/N₂/H₂誘導熱プラズマを用いたTi基板表面の高速窒化試験

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Volume： PST-17 Issue： 78-92 Page： 23-28 Publication year： Oct. 25, 2017
JST Material Number： Z0951A Document type： Proceedings
Article type：短報 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Rapid Nitridation of Ti Surface using Ar/N2/H2 Loop Type of Inductively Coupled Thermal Plasmas

Rapid Nitridation of Ti Surface using Ar/N₂/H₂ Loop Type of Inductively Coupled Thermal Plasmas