T. Hamachi, T. Tohei, Y. Hayashi, S. Usami, M. Imanishi, Y. Mori, K. Sumitani, Y. Imai, S. Kimura, A. Sakai. Analysis of local strain fields around individual threading dislocations in GaN substrates by nanobeam x-ray diffraction. Journal of Applied Physics. 2024. 135. 22
Tomoki Onabe, Zhendong Wu, Tetsuya Tohei, Yusuke Hayashi, Kazushi Sumitani, Yasuhiko Imai, Shigeru Kimura, Takahiro Naito, Kohei Hamaya, Akira Sakai. Local strain distribution analysis in strained SiGe spintronics devices. Japanese Journal of Applied Physics. 2024. 63. 2
Toshikazu Sato, Takeaki Hamachi, Tetsuya Tohei, Yusuke Hayashi, Masayuki Imanishi, Shigeyoshi Usami, Yusuke Mori, Akira Sakai. Conduction mechanism of Schottky contacts fabricated on etch pits originating from single threading dislocation in a highly Si-doped HVPE GaN substrate. Materials Science in Semiconductor Processing. 2023. 167
Yudai Nakanishi, Yusuke Hayashi, Takeaki Hamachi, Tetsuya Tohei, Yoshikata Nakajima, Shiyu Xiao, Kanako Shojiki, Hideto Miyake, Akira Sakai. Micro- and Nanostructure Analysis of Vapor-Phase-Grown AlN on Face-to-Face Annealed Sputtered AlN/Nanopatterned Sapphire Substrate Templates. Journal of Electronic Materials. 2023
Takeaki Hamachi, Tetsuya Tohei, Yusuke Hayashi, Masayuki Imanishi, Shigeyoshi Usami, Yusuke Mori, Akira Sakai. Comprehensive analysis of current leakage at individual screw and mixed threading dislocations in freestanding GaN substrates. Scientific Reports. 2023. 13. 1