Toyoda Noriaki

トヨダノリアキ | Toyoda Noriaki

Affiliation and department：

Research field (4)： Manufacturing and production engineering , Quantum beam science , Nanomaterials , Thin-film surfaces and interfaces

Research keywords (4)： nano-fabrication , cluster , surface modification , ion beam

Research theme for competitive and other funds (4)：

2019 - 2022 Cell metabolic activity via non-vacuum ion implantation utilizing an enhanced electric field at a sharpened glass tip
2017 - 2020 Atomic layer etching of transition metal chalcogenide with gas cluster ion beam
2011 - 2014 Damage-free etching of organic materials with mesoscopic cluster beams
2005 - 2006 ガスクラスターイオンビームを用いた超精密3次元形状加工技術の開発

Papers (183)：

Masaya Takeuchi, Noriaki Toyoda. Pressure resistance evaluation of an ultrathin SiNx membrane etched by a gas cluster ion beam. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 2024. 550. 165317-165317
Masaya Takeuchi, Reki Fujiwara, Noriaki Toyoda. Atomic layer etching of silicon nitride film by oxygen gas cluster ion beam with acetylacetone. Japanese Journal of Applied Physics. 2023
S. Hanahara, M. Takeuchi, N. Toyoda. Surface preparation of metal films by gas cluster ion beams using organic acid vapor for Cu-Cu bonding. Japanese Journal of Applied Physics. 2022. 61. SF. SF1004-SF1004
豊田紀章. ガスクラスタイオン照射を用いた原子層エッチング. 応用物理. 2021. 90. 4. 239-243
Takashi Ikeda, Keishiro Tahara, Tomofumi Kadoya, Hiroyuki Tajima, Noriaki Toyoda, Satoshi Yasuno, Yoshiki Ozawa, Masaaki Abe. Ferrocene on Insulator: Silane Coupling to a SiO2 Surface and Influence on Electrical Transport at a Buried Interface with an Organic Semiconductor Layer. Langmuir. 2020. 36. 21. 5809-5819

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MISC (42)：

豊田紀章. クラスターイオンビーム励起による表面反応と原子層エッチングへの応用. 光技術コンタクト. 2022. 60. 10. 23
Naoteru Shigekawa, Hideki Takagi, Masahisa Fujino, Eiji Higurashi, Nobuhiko Nishiyama, Takehito Shimatsu, Noriaki Toyoda. Low Temperature Bonding for 3D Integration FOREWORD. JAPANESE JOURNAL OF APPLIED PHYSICS. 2020. 59
High-Precision Processing with Gas Cluster Ion Beams. 2016. 55-59
Recent Developments in Gas Cluster Ion Beam Technology. 2016. 62-68
New getting method for thinned Si using gas cluster ion beam. 2012. 27-29

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Books (1)：

Lectures and oral presentations (12)：

O2-GCIBとアセチルアセトンによるSiNx膜原子層エッチングプロセスの反応機構の検討
(第70回応用物理学会春季学術講演会 2023)
反応性ガス吸着とO2-GCIBを用いたNiパターンエッチング
(第70回応用物理学会春季学術講演会 2023)
中性クラスタービーム照射とVUV光を用いた金属膜のALE
(第70回応用物理学会春季学術講演会 2023)
Atomic layer etching with gas cluster ion beam of SiNx film for photoelectron transmittance window
(35th International Microprocesses and Nanotechnology Conference 2022)
クラスタービームによる原子レベル加工
(イノベーションジャパン2022 2022)

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Education (3)：

- 1999 Kyoto University Graduate School of Engineering Deprtment of Electronic Science and Engineering
- 1996 Kyoto University Graduate School of Engineering Department of Electronic Science and Engineering
- 1994 Kyoto University Faculty of Engineering

Professional career (1)：

Work history (8)：

2024/04 - 現在兵庫県立大学社会価値創造機構副機構長
2020/04 - 現在 University of Hyogo Department of Electronics and Computer Science, Graduate School of Engineering Professor
2021/04 - 2024/03 University of Hyogo
2015/04 - 2020/03 University of Hyogo Department of Electronics and Computer Science, Graduate School of Engineering Associate professor
2007/07 - 2015/03 University of Hyogo Incubation center, Graduate school of engineering, Associate professor

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Committee career (9)：

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Awards (1)：

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