Nishinaka Hiroyuki

Affiliation and department：

Research field (2)： Electronic devices and equipment , Crystal engineering

Research keywords (4)： Oxide thin films , CVD , Epitaxial growth , Crystal growth

Research theme for competitive and other funds (8)：

2023 - 2025 細胞外電子伝達菌と光半導体による高効率人工光合成への挑戦
2022 - 2025 Research of ultra-low power switching devices based on ferroelectric kappa-Ga2O3
2019 - 2022 Research on Polarization-Controlled Ultra-Wide Bandgap Semiconductor Devices
2019 - 2021 Hetero-junction devices of lattice matched alpha-(In1-xAlx)2O3 semiconductors
2019 - 2020 3次元構造への高速被膜技術の開発

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Papers (77)：

Kazuki Shimazoe, Hiroyuki Nishinaka, Masahiro Yoshimoto. Heteroepitaxial growth of a-, m-, and r-plane α-Ga2O3 thin films on rh-ITO electrodes for vertical device applications. Journal of Crystal Growth. 2024. 630
Yoko Taniguchi, Hiroyuki Nishinaka, Kazuki Shimazoe, Toshiyuki Kawaharamura, Kazutaka Kanegae, Masahiro Yoshimoto. Visible-light absorption of indium oxide thin films via Bi³⁺ doping for visible-light-responsive photocatalysis. Materials Chemistry and Physics. 2024. 315. 128961
Kazuki Shimazoe, Hiroyuki Nishinaka, Masahiro Yoshimoto. Demonstration of vertical schottky barrier diodes based on α-Ga2O3 thin films enabled by corundum structured rh-ITO bottom electrodes. MRS Advances. 2024
Shoma Hosaka, Hiroyuki Nishinaka, Temma Ogawa, Hiroki Miyake, Masahiro Yoshimoto. High conductivity of n-type β-Ga2O3(010) thin films achieved through Si doping by mist chemical vapor deposition. AIP Advances. 2024. 14. 1. 015040
Osamu Ueda, Hiroyuki Nishinaka, Noriaki Ikenaga, Noriyuki Hasuike, Masahiro Yoshimoto. TEM characterization of defects in κ-(Inx Ga1-x )2O3 thin film grown on (001) FZ-grown ε-GaFeO3 substrate by mist CVD. Japanese Journal of Applied Physics. 2023. 62. 12

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MISC (16)：

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Patents (76)：

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Lectures and oral presentations (70)：

Mist CVD for tailoring five polymorphs via epitaxial techniques
(SPIE Photonics West 2024)
可視光応答型光触媒応用に向けた Bi 添加In2O3 薄膜およびナノロッドの作製とその光学特性評価
(材料学会半導体エレクロトニクス部門委員会第3回研究会 2024)
ラマン分光法によるp 型GaAsBi の正孔移動度算出
(材料学会半導体エレクロトニクス部門委員会第3回研究会 2024)
発光デバイス応用に向けたCs-Cu-I 系のマイクロロッド成長と物性評価
(材料学会半導体エレクロトニクス部門委員会第3回研究会 2024)
熱の出入りを制御可能なスマートウインドウに向けたN ドープVO2 薄膜に関する研究
(材料学会半導体エレクロトニクス部門委員会第3回研究会 2024)

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Professional career (1)：

Work history (5)：

2020/02 - 現在 Kyoto Institute of Technology Faculty of Electrical Engineering and Electronics Associate Professor
2023/08 - 2023/10 University of Colorado Colorado Springs Visiting Scholor
2023/04 - 2023/05 University of Valencia Visiting Scholor
2015/01 - 2020/01 京都工芸繊維大学 Faculty of Electrical Engineering and Electronics Assistant Professor
2009/04 - 2014/12 SHARP Corporation

Awards (6)：

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Association Membership(s) (4)：

IEEE , THE SOCIETY OF MATERIALS SCIENCE, JAPAN , THE JAPAN SOCIETY OF APPLIED PHYSICS , American Chemical Society

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