Research field (2):
Electronic devices and equipment
, Crystal engineering
Research keywords (4):
Oxide thin films
, CVD
, Epitaxial growth
, Crystal growth
Research theme for competitive and other funds (8):
2023 - 2025 細胞外電子伝達菌と光半導体による高効率人工光合成への挑戦
2022 - 2025 Research of ultra-low power switching devices based on ferroelectric kappa-Ga2O3
2019 - 2022 Research on Polarization-Controlled Ultra-Wide Bandgap Semiconductor Devices
2019 - 2021 Hetero-junction devices of lattice matched alpha-(In1-xAlx)2O3 semiconductors
2019 - 2020 3次元構造への高速被膜技術の開発
2017 - 2019 Hetero-junction devices of epsilon-Ga2O3 semiconductors by mist CVD technique
2016 - 2019 Fabrication of bismuth-containing narrow-bandgap semimetal-semiconductor alloys and their application to photonic devices
2015 - 2017 Mist CVD method for inorganic-organic perovskites solar-cell
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Papers (77):
Kazuki Shimazoe, Hiroyuki Nishinaka, Masahiro Yoshimoto. Heteroepitaxial growth of a-, m-, and r-plane α-Ga2O3 thin films on rh-ITO electrodes for vertical device applications. Journal of Crystal Growth. 2024. 630
Yoko Taniguchi, Hiroyuki Nishinaka, Kazuki Shimazoe, Toshiyuki Kawaharamura, Kazutaka Kanegae, Masahiro Yoshimoto. Visible-light absorption of indium oxide thin films via Bi3+ doping for visible-light-responsive photocatalysis. Materials Chemistry and Physics. 2024. 315. 128961
Kazuki Shimazoe, Hiroyuki Nishinaka, Masahiro Yoshimoto. Demonstration of vertical schottky barrier diodes based on α-Ga2O3 thin films enabled by corundum structured rh-ITO bottom electrodes. MRS Advances. 2024
Shoma Hosaka, Hiroyuki Nishinaka, Temma Ogawa, Hiroki Miyake, Masahiro Yoshimoto. High conductivity of n-type β-Ga2O3(010) thin films achieved through Si doping by mist chemical vapor deposition. AIP Advances. 2024. 14. 1. 015040
Osamu Ueda, Hiroyuki Nishinaka, Noriaki Ikenaga, Noriyuki Hasuike, Masahiro Yoshimoto. TEM characterization of defects in κ-(Inx Ga1-x )2O3 thin film grown on (001) FZ-grown ε-GaFeO3 substrate by mist CVD. Japanese Journal of Applied Physics. 2023. 62. 12
Mist CVD technology for the fabrication of oxide thin films. Annual report of Ion Beam Engineering Laboratory, University of Hyogo. 2008. 2008. 183-193