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J-GLOBAL ID：201802221941423149   Reference number：18A0972056

Two-dimensional simulations of multi-hollow VHF SiH4/H2 plasma

多中空VHF SiH_4/H_2プラズマの二次元シミュレーション【JST・京大機械翻訳】
Author (4)：
Su Li-Wen

About Su Li-Wen

(Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-85802, Japan)

About Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-85802, Japan

, 
Chen Weiting

About Chen Weiting

(Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-85802, Japan)

About Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-85802, Japan

, 
Uchino Kiichiro

About Uchino Kiichiro

(Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-85802, Japan)

About Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-85802, Japan

, 
Kawai Yoshinobu

About Kawai Yoshinobu

(Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-85802, Japan)

About Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-85802, Japan


Material：
AIP Advances (Web)

About AIP Advances (Web)


Volume： 8  Issue： 2  Page： 025316-025316-10  Publication year： 2018 
JST Material Number： U7121A  ISSN： 2158-3226  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Abstract/Point：
Abstract/Point
Japanese summary of the article(about several hundred characters).
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A triode multi-hollow VHF SiH<...
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Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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electron temperature

About electron temperature

, 
amorphous silicon

About amorphous silicon

, 
rate of sedimentation

About rate of sedimentation

, 
reaction rate constant

About reaction rate constant

, 
*plasma

About plasma

, 
electron density

About electron density

, 
plasma source

About plasma source

, 
*simulation

About simulation

, 
multiplex

About multiplex

, 
*two dimension

About two dimension

, 
high speed

About high speed


Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
ラジカル密度

About ラジカル密度

, 
VHFプラズマ

About VHFプラズマ

, 
プラズマ特性

About プラズマ特性

, 
流体模型

About 流体模型

, 【Automatic Indexing@JST】
JST classification (2)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films 
(BK14040E)

About Semiconductor thin films

,  Plasma production and heating 
(BJ02060E)

About Plasma production and heating

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
中空

About 中空

, 
VHF

About VHF

, 
プラズマ

About プラズマ

, 
シミュレーション

About シミュレーション


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