Art

J-GLOBAL ID：201802259089878699   Reference number：18A1998946

Mechanisms of oxidation of pure and Si-segregated α-Ti surfaces

純及びSi偏析α-Ti表面の酸化機構【JST・京大機械翻訳】

Author (5)： Bhattacharya Somesh Kr. (Research Center for Structural Materials, National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan) ,  Sahara Ryoji (Research Center for Structural Materials, National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan) ,  Suzuki Satoshi (Department of Materials Processing, Tohoku University, 6-6-2 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan) ,  Ueda Kyosuke (Department of Materials Processing, Tohoku University, 6-6-2 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan) ,  Narushima Takayuki (Department of Materials Processing, Tohoku University, 6-6-2 Aza Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan)
Material： Applied Surface Science  (Appl Surf Sci)
Volume： 463  Page： 686-692  Publication year： 2019 
JST Material Number： B0707B  ISSN： 0169-4332  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Abstract/Point： Using first-principles molecul...

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Thesaurus term： *silicon ,  alloy ,  Oxygen ,  *Titanium ,  *oxidation ,  high temperature ,  oxidation resistance ,  molecular dynamics ,  charge transfer ,  oxide ,  first principle ,  network ,  *segregation (concentration distribution) ,  invasion
Semi thesaurus term： 酸化状態 , 【Automatic Indexing@JST】

Author keywords (5)： Oxidation ,  α-Ti ,  High temperature ,  Surface ,  Molecular dynamics

JST classification (2)： Metallic thin films  (BK14030T) ,  Other noncatalytic reactions  (CB06070U)

Terms in the title (4)： Si ,  偏析 ,  Ti ,  酸化機構