Art

J-GLOBAL ID：201802285341916078   Reference number：18A1758371

Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer

メチルα-アリルオキシメチルアクリル重合体の電子線誘起反応に関する研究

Author (7)： Hosaka Yuji (Quantum Beam Science Research Directorate, National Institutes for Quantum and Radiological Science and Technology (QST)) ,  Kondoh Takafumi (The Institute of Scientific and Industrial Research, Osaka University) ,  Gowa Oyama Tomoko (Quantum Beam Science Research Directorate, National Institutes for Quantum and Radiological Science and Technology (QST)) ,  Uchida Tomoya (Waseda Research Institute for Science and Engineering, Waseda University) ,  Taguchi Mitsumasa (Quantum Beam Science Research Directorate, National Institutes for Quantum and Radiological Science and Technology (QST)) ,  Yoshida Yoichi (The Institute of Scientific and Industrial Research, Osaka University) ,  Washio Masakazu (Waseda Research Institute for Science and Engineering, Waseda University)
Material： Journal of Photopolymer Science and Technology  (フォトポリマー懇話会誌)
Volume： 31  Issue： 1  Page： 85-90(J-STAGE)  Publication year： 2018 
JST Material Number： L0202A  ISSN： 0914-9244  CODEN： JSTEEW  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： reactive polymer ,  *electron beam resist ,  *acrylic resin ,  chemical reaction ,  photoinitiator ,  resist ,  molecular structure ,  pulse radiolysis ,  cyclic ether
Semi thesaurus term： negative type resist ,  photoinitiator ,  polymer structure ,  *reactive polymer ,  *induced reaction

Author keywords (5)： α-Allyloxymethyl acrylic polymer ,  Poly(methyl methacrylate) ,  Electron beam resist ,  Pulse radiolysis ,  Tetrahydrofuran

JST classification (3)： Other reactions of polymer  (CG03040H) ,  Manufacturing technology of solid-state devices  (NC03030V) ,  Acrylic resins  (YH07110K)

Substance index (1)： Tetrahydrofuran

Reference (20)：

• 1. T. Kaneko, U. S. Patent 8,497,332 B2 (2013).
• 2. S. Tanaka and K. Kahara, Japan Patent 2015-022175A (2015).
• 3. Y. Hosaka, C. Wang, Y. Soeta, Y. Saito, T. Kondoh, Y. Yoshida, A Oshima, and M. Washio, proc. IRaP 2016 (2016) O54.
• 4. T. Kaneko and T. Moriguchi, Japan Patent 5591543B2 (2014).
• 5. H. Hirayama, Y. Namito, A. F. Bielajew, S. J. Wilderman, and W. R. Nelson, Stanford Linear Accelerator Center Report 2005 (2005) SLAC-R-730.

Terms in the title (4)： 重合体 ,  電子線 ,  誘起反応 ,  研究