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J-GLOBAL ID:201901003265981016   Update date: Nov. 19, 2024

SAKAKITA HAJIME

サカキタ ハジメ | SAKAKITA HAJIME
Affiliation and department:
Research field  (1): Chemical reaction and process system engineering
Research theme for competitive and other funds  (10):
  • 2021 - 2024 低温大気圧プラズマ照射による溶液中帯電粒子の輸送制御
  • 2020 - 2023 中性子捕捉療法用低毒性ボロン製剤の生成に関する研究
  • 2016 - 2018 Efficient epitaxial growth of single crystalline diamond by production of high radicals and electrons
  • 2012 - 2017 Elucidation of interactive mechanism on wound healing process after low temperature plasma treatment
  • 2013 - 2016 Study on innovative nano particle drag for neutron capture therapy
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Papers (134):
  • Tetsuji Shimizu, Takahiro Fukui, Hajime Sakakita. Albumin aggregation using low-temperature atmospheric pressure helium plasma jet in argon and air atmosphere. Japanese Journal of Applied Physics. 2022. 61. SI. SI1016-SI1016
  • Hajime Sakakita, Naoto Kumagai, Tetsuji Shimizu, Jaeho Kim, Hisashi Yamada, Xue-lun Wang. Ammonia-free epitaxy of single-crystal InN using a plasma-integrated gas-injection module. Applied Materials Today. 2022. 27. 101489-101489
  • Tetsuji Shimizu, Kazuya Kikunaga, Susumu Kato, Hajime Sakakita. Potential formation on floating metal plate treated by low-temperature atmospheric pressure plasma jet. Journal of Electrostatics. 2022. 117. 103715-103715
  • Chen G, Tsuji T, Yamada M, He J, Shimizu Y, Sakakita H, Hata K, Futaba D, Sakurai S. Multi-step chemical vapor synthesis reactor based on a microplasma for structure-controlled synthesis of single-walled carbon nanotubes. Chemical Engineering Journal. 2022. 444. 136634
  • Kumagai N, Itagaki H, Kim J, Hirose S, Sakakita H, Wang X-L. Comprehensive characterization of low-damaged GaN surface exposed to NH3 plasma toward plasma-induced metalorganic chemical vapor deposition. Applied Surface Science. 2022. 591. 153150-1-153150-11
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MISC (114):
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Professional career (1):
  • 博士(工学) (名古屋大学)
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