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J-GLOBAL ID：201902000060719151   Reference number：19S2996948

Low-temperature reactive ion etching and microwave plasma etching of silicon

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Author (3)：
Tachi, Shinichi

About Tachi, Shinichi

(Central Research Laboratory, Hitachi Ltd.)

About Central Research Laboratory, Hitachi Ltd.

, 
Tsujimoto, Kazunori

About Tsujimoto, Kazunori

(Central Research Laboratory, Hitachi Ltd.)

About Central Research Laboratory, Hitachi Ltd.

, 
Okudaira, Sadayuki

About Okudaira, Sadayuki

(Central Research Laboratory, Hitachi Ltd.)

About Central Research Laboratory, Hitachi Ltd.


Material：
Applied Physics Letters

About Applied Physics Letters


Volume： 52  Issue： 8  Page： 616-618  Publication year： 1988 
JST Material Number： SCOPUS  ISSN： 0003-6951 
Language： English (EN)

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