Art
J-GLOBAL ID:201902008801432174   Reference number:19S2946318

Reaction Mechanism of Chemical Vapor Deposition Using Tetraethylorthosilicate and Ozone at Atmospheric Pressure

Author (3):
Material:
Volume: 31  Issue: 9 R  Page: 2925-2930  Publication year: 1992 
JST Material Number: SCOPUS  ISSN: 0021-4922 
Language: English (EN)

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