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J-GLOBAL ID：201902012071275733   Reference number：19S2707989

Spatial distribution of SiH3 radicals in RF silane plasma

Author (8)： Itabashi, Naoshi (Department of Electronics, Nagoya University) ,  Nishiwaki, Nobuki (Department of Electronics, Nagoya University) ,  Magane, Mitsuo (Department of Electronics, Nagoya University) ,  Naito, Susumu (Department of Electronics, Nagoya University) ,  Goto, Toshio (Department of Electronics, Nagoya University) ,  Matsuda, Akihisa (Electrotechnical Laboratory) ,  Yamada, Chikashi (Institute for Molecular Science) ,  Hirota, Eizi (Institute for Molecular Science)
Material： Japanese Journal of Applied Physics
Volume： 29  Issue： 3  Page： L505-L507  Publication year： 1990 
JST Material Number： SCOPUS  ISSN： 0021-4922 
Language： English (EN)

Terms in the title (1)： RF