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J-GLOBAL ID：201902014414733050   Reference number：19S3070011

Group III impurity doped zinc oxide thin films prepared by RF magnetron sputtering

Author (4)： Minami, Tadatsugu (Electron Device System Laboratory, Kanazawa Institute of Technology) ,  Sato, Hirotoshi (Electron Device System Laboratory, Kanazawa Institute of Technology) ,  Nanto, Hidehito (Electron Device System Laboratory, Kanazawa Institute of Technology) ,  Takata, Shinzo (Electron Device System Laboratory, Kanazawa Institute of Technology)
Material： Japanese Journal of Applied Physics
Volume： 24  Issue： 10  Page： L781-L784  Publication year： 1985 
JST Material Number： SCOPUS  ISSN： 0021-4922 
Language： English (EN)

Terms in the title (1)： RF