Art

J-GLOBAL ID：201902017009540902   Reference number：19S2432449

Radiation-induced acid generation reactions in chemically amplified resists for electron beam and x-ray lithography

Author (4)： Kozawa, Takahiro (Nuclear Engineering Research Laboratory, The University of Tokyo) ,  Kozawa, Takahiro (Research Center for Nuclear Science and Technology, The University of Tokyo) ,  Yoshida, Yoichi (Nuclear Engineering Research Laboratory, The University of Tokyo) ,  Uesaka, Mitsuru (Nuclear Engineering Research Laboratory, The University of Tokyo)
Material： Japanese Journal of Applied Physics
Volume： 31  Issue： 12 S  Page： 4301-4306  Publication year： 1992 
JST Material Number： SCOPUS  ISSN： 0021-4922 
Language： English (EN)