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J-GLOBAL ID：201902108785539502   Reference number：19S2380280

Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

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Author (2)：
Endo, Kazuhiko

About Endo, Kazuhiko

(Microelectronics Research Laboratories, NEC Corporation)

About Microelectronics Research Laboratories, NEC Corporation

, 
Tatsumi, Toru

About Tatsumi, Toru

(Microelectronics Research Laboratories, NEC Corporation)

About Microelectronics Research Laboratories, NEC Corporation


Material：
Journal of Applied Physics

About Journal of Applied Physics


Volume： 78  Issue： 2  Page： 1370-1372  Publication year： 1995 
JST Material Number： SCOPUS  ISSN： 0021-8979 
Language： English (EN)

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