Art

J-GLOBAL ID：201902112791060895   Reference number：19S2868101

Gaas radiation damage induced by electron cyclotron resonance plasma etching with sf6/chf3

Author (8)： Mitani, Katsuhiko (Fiberoptics Division, Hitachi, Limited) ,  Mitani, Katsuhiko (Kasado Works, Hitachi, Limited) ,  Oda, Hiroto (Fiberoptics Division, Hitachi, Limited) ,  Oda, Hiroto (Hitachi ULSIEngineering Corporation) ,  Kasai, Junichi (Fiberoptics Division, Hitachi, Limited) ,  Kasai, Junichi (Central Research Laboratory, Hitachi Limited) ,  Imamura, Yoshinori (Fiberoptics Division, Hitachi, Limited) ,  Imamura, Yoshinori (Central Research Laboratory, Hitachi Limited)
Material： Japanese Journal of Applied Physics
Volume： 34  Issue： 8 R  Page： 3970-3975  Publication year： 1995 
JST Material Number： SCOPUS  ISSN： 0021-4922 
Language： English (EN)

Terms in the title (2)： GaAs ,  SF6