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J-GLOBAL ID：201902119625019113   Reference number：19S2473066

Detection of Intermediates in Thermal Chemical Vapor Deposition Process Using Tetraethoxysilane

Author (5)： Satake, Tetsuya (Central Research Laboratory, Mitsubishi Electric Corporation) ,  Sorita, Tetsuji (Central Research Laboratory, Mitsubishi Electric Corporation) ,  Fujioka, Hirofumi (Central Research Laboratory, Mitsubishi Electric Corporation) ,  Adachi, Hiroshi (Central Research Laboratory, Mitsubishi Electric Corporation) ,  Nakajima, Hiroyuki (Central Research Laboratory, Mitsubishi Electric Corporation)
Material： Japanese Journal of Applied Physics
Volume： 33  Issue： 6R  Page： 3339-3342  Publication year： 1994 
JST Material Number： SCOPUS  ISSN： 0021-4922 
Language： English (EN)