Art

J-GLOBAL ID：201902200271586793   Reference number：19S0223701

Large area SiH4/H2 VHF plasma produced with multi-rod electrode

Author (8)： Nishimiya, Tatsuyuki (Nagasaki Research and Development Center, Mitsubishi Heavy Industries Ltd.) ,  Takeuchi, Yoshiaki (Nagasaki Research and Development Center, Mitsubishi Heavy Industries Ltd.) ,  Yamauchi, Yasuhiro (Nagasaki Shipyard and Machinery Works, Mitsubishi Heavy Industries Ltd.) ,  Takatsuka, Hiromu (Nagasaki Shipyard and Machinery Works, Mitsubishi Heavy Industries Ltd.) ,  Kai, Yuichi (Interdisciplinary Graduate School of Engineering Sciences, Kyushu University) ,  Muta, Hiroshi (Interdisciplinary Graduate School of Engineering Sciences, Kyushu University) ,  Kawai, Yoshinobu (Interdisciplinary Graduate School of Engineering Sciences, Kyushu University) ,  Kawai, Yoshinobu (Research Institute for Applied Mechanics, Kyushu University)
Material： Plasma Processes and Polymers
Volume： 4  Issue： SUPPL.1  Page： S991-S994  Publication year： 2007 
JST Material Number： SCOPUS  ISSN： 1612-8850 
Country of issue： Germany (DEU)  Language： English (EN)

Terms in the title (3)： SiH4 ,  H2 ,  VHF