Art

J-GLOBAL ID：201902201887754211   Reference number：19S0702185

Characterization of ion implanted silicon using UV Raman and multiwavelength photoluminescence for in-line dopant activation monitoring

Author (7)： Yoo, Woo Sik (WaferMasters, Inc.) ,  Ishigaki, Toshikazu (WaferMasters, Inc.) ,  Ueda, Takeshi (WaferMasters, Inc.) ,  Kang, Kitaek (WaferMasters, Inc.) ,  Hasuike, Noriyuki (Kyoto Institute of Technology) ,  Harima, Hiroshi (Kyoto Institute of Technology) ,  Yoshimoto, Masahiro (Kyoto Institute of Technology)
Material： Extended Abstracts of the 13th International Workshop on Junction Technology 2013, IWJT 2013
Page： 41-44  Publication year： 2013 
JST Material Number： SCOPUS 
Country of issue： United States (USA)  Language： English (EN)