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J-GLOBAL ID：201902203828767892   Reference number：19S0023913

Diagnostics of ablation dynamics of Tin micro-Droplet for EUV lithography light source

Author (14)： Nakamura, D. (Graduate School of Information Science and Electrical Engineering, Kyushu University) ,  Akiyama, T. (Graduate School of Information Science and Electrical Engineering, Kyushu University) ,  Toya, K. (Graduate School of Information Science and Electrical Engineering, Kyushu University) ,  Okada, T. (Graduate School of Information Science and Electrical Engineering, Kyushu University) ,  Okazaki, K. (Graduate School of Medical Sciences, Kyushu University) ,  Takahashi, A. (Graduate School of Medical Sciences, Kyushu University) ,  Yanagida, T. (Extreme Ultraviolet Lithography System Development Association (EUVA)) ,  Ueno, Y. (Extreme Ultraviolet Lithography System Development Association (EUVA)) ,  Suganuma, T. (Extreme Ultraviolet Lithography System Development Association (EUVA)) ,  Nakano, M. (Extreme Ultraviolet Lithography System Development Association (EUVA)) ,  Komori, H. (Extreme Ultraviolet Lithography System Development Association (EUVA)) ,  Sumitani, A. (Extreme Ultraviolet Lithography System Development Association (EUVA)) ,  Endo, A. (Extreme Ultraviolet Lithography System Development Association (EUVA)) ,  Sasaki, Y. (Gigaphoton Inc.)
Material： Optics InfoBase Conference Papers
Publication year： 2009 
JST Material Number： SCOPUS  ISSN： 2162-2701  ISBN： 9781424438303 
Country of issue： United States (USA)  Language： English (EN)

Terms in the title (3)： TiN ,  EUV ,  LIGHT