Art

J-GLOBAL ID：201902204252815531   Reference number：19S0564783

Nano-artifact metrics based on random collapse of resist

Author (10)： Matsumoto, Tsutomu (Graduate School of Environment and Information Sciences, Yokohama National University) ,  Hanaki, Kenta (Graduate School of Environment and Information Sciences, Yokohama National University) ,  Suzuki, Ryosuke (Graduate School of Environment and Information Sciences, Yokohama National University) ,  Sekiguchi, Daiki (Graduate School of Environment and Information Sciences, Yokohama National University) ,  Hoga, Morihisa (Dai Nippon Printing Co. Ltd.) ,  Ohyagi, Yasuyuki (Dai Nippon Printing Co. Ltd.) ,  Ishikawa, Mikio (Dai Nippon Printing Co. Ltd.) ,  Naruse, Makoto (Photonic Network Research Institute, National Institute of Information and Communications Technology) ,  Tate, Naoya (Department of Electrical Engineering and Information Systems, Graduate School of Engineering, University of Tokyo) ,  Ohtsu, Motoichi (Department of Electrical Engineering and Information Systems, Graduate School of Engineering, University of Tokyo)
Material： Scientific Reports
Volume： 4  Publication year： 2014 
JST Material Number： SCOPUS  ISSN： 2045-2322 
Country of issue： United Kingdom (GBR)  Language： English (EN)