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J-GLOBAL ID：201902204532884849   Reference number：19S1442165

A study of the critical factor determining the size of etched latent tracks formed on SiO 2 glass by swift-Cl-ion irradiation

Author (8)： Nomura, Ken-Ichi (Department of Electrical Engineering and Bioscience, Waseda University) ,  Nomura, Ken-Ichi (Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)) ,  Ohki, Yoshimichi (Department of Electrical Engineering and Bioscience, Waseda University) ,  Wang, Xiaomin (Department of Electrical Engineering and Bioscience, Waseda University) ,  Wang, Xiaomin (Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)) ,  Fujimaki, Makoto (Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)) ,  Awazu, Koichi (Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)) ,  Komatsubara, Tetsuro (Tandem Accelerator Complex, Research Facility Center for Science and Technology, University of Tsukuba)
Material： Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume： 272  Page： 1-4  Publication year： 2012 
JST Material Number： SCOPUS  ISSN： 0168-583X  CODEN： NIMBE 
Country of issue： Netherlands (NLD)  Language： English (EN)

Terms in the title (1)： SiO