Art
J-GLOBAL ID：201902208594293320   Reference number：19S1057685

High density electron emission from graphite nano-structure fabricated by hydrogen plasma etching and its application to high intensity pulse X-ray generation

  • Publisher site Copy service
  • Access JDreamⅢ for advanced search and analysis.
Author (2)：
Matsumoto, Takahiro

About Matsumoto, Takahiro

(Research and Development Center, Stanley Electric Corporation)

About Research and Development Center, Stanley Electric Corporation

, 
Mimura, Hidenori

About Mimura, Hidenori

(Research Institute of Electronics, Shizuoka University)

About Research Institute of Electronics, Shizuoka University


Material：
Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

About Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003


Page： 192-  Publication year： 2003 
JST Material Number： SCOPUS  ISBN： 9784891140403 
Country of issue： United States (USA)  Language： English (EN)
Terms in the title (1)：
Terms in the title
Keywords automatically extracted from the title.
ITS

About ITS


Return to Previous Page

TOP

BOTTOM