Art

J-GLOBAL ID：201902210136827905   Reference number：19S0366744

A calculation method of deposition profiles in chemical vapor deposition reactors using bio-inspired algorithms

Author (6)： Takahashi, Takahiro (Department of Electrical and Electronic Engineering, Graduate School of Engineering, Shizuoka University) ,  Ema, Yoshinori (Department of Electrical and Electronic Engineering, Graduate School of Engineering, Shizuoka University) ,  Inagaki, Taeka (Department of Electrical and Electronic Engineering, Faculty of Engineering, Shizuoka University) ,  Nariai, Shingo (Department of Electrical and Electronic Engineering, Faculty of Engineering, Shizuoka University) ,  Kodama, Junichi (Department of Electrical and Electronic Engineering, Faculty of Engineering, Shizuoka University) ,  Arakawa, Masamoto (Department of Business Administration, Ube National College of Technology)
Material： Physica Status Solidi (C) Current Topics in Solid State Physics
Volume： 12  Issue： 7  Page： 908-911  Publication year： 2015 
JST Material Number： SCOPUS  ISSN： 1862-6351 
Country of issue： Germany (DEU)  Language： English (EN)