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J-GLOBAL ID：201902212790822249   Reference number：19S1951961

Characteristics of CVD silicon oxide films: Effect of discharge form on formation and properties of films

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Author (2)：
Ishimaru, Kazuhiro

About Ishimaru, Kazuhiro

(Department of Mechanical Engineering, Gifu National College of Technology)

About Department of Mechanical Engineering, Gifu National College of Technology

, 
Okazaki, Ken

About Okazaki, Ken

(Department of Mech./Control Eng., Tokyo Institute of Technology)

About Department of Mech./Control Eng., Tokyo Institute of Technology


Material：
Heat Transfer - Asian Research

About Heat Transfer - Asian Research


Volume： 33  Issue： 2  Page： 106-116  Publication year： 2004 
JST Material Number： SCOPUS  ISSN： 1099-2871  CODEN： HTARF 
Country of issue： United States (USA)  Language： English (EN)
Terms in the title (1)：
Terms in the title
Keywords automatically extracted from the title.
CVD

About CVD


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