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J-GLOBAL ID：201902213753763174   Reference number：19S1380195

Influence of 700 °C vacuum annealing on fracture behavior of micro/nanoscale focused ion beam fabricated silicon structures

Author (5)： Goshima, Yoshiharu (Department of Mechanical Engineering, University of Hyogo) ,  Goshima, Yoshiharu (Production Technology Department HORIBA Ltd.) ,  Fujii, Tatsuya (Department of Mechanical Engineering, University of Hyogo) ,  Inoue, Shozo (Department of Mechanical Engineering, University of Hyogo) ,  Namazu, Takahiro (Department of Mechanical Engineering, University of Hyogo)
Material： Japanese Journal of Applied Physics
Volume： 55  Issue： 6  Publication year： 2016 
JST Material Number： SCOPUS  ISSN： 0021-4922 
Country of issue： Japan (JPN)  Language： English (EN)