Art
J-GLOBAL ID：201902213961648516   Reference number：19S0788393

Fabrication of a Si stencil mask for the X-ray lithography using a dry etching technique

  • Publisher site Copy service
  • Access JDreamⅢ for advanced search and analysis.
Author (4)：
Mekaru, Harutaka

About Mekaru, Harutaka

(Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST))

About Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)

, 
Takano, Takayuki

About Takano, Takayuki

(Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST))

About Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)

, 
Maeda, Ryutaro

About Maeda, Ryutaro

(Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST))

About Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)

, 
Awazu, Koichi

About Awazu, Koichi

(Center for Applied Near Field Optics Research, National Institute of Advanced Industrial Science and Technology (AIST))

About Center for Applied Near Field Optics Research, National Institute of Advanced Industrial Science and Technology (AIST)


Material：
Journal of Physics: Conference Series

About Journal of Physics: Conference Series


Volume： 34  Issue： 1  Page： 859-864  Publication year： 2006 
JST Material Number： SCOPUS  ISSN： 1742-6588 
Country of issue： United Kingdom (GBR)  Language： English (EN)
Terms in the title (1)：
Terms in the title
Keywords automatically extracted from the title.
Si

About Si


Return to Previous Page

TOP

BOTTOM